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OALib Journal期刊
ISSN: 2333-9721
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偏压对阴极电弧离子镀aln薄膜的影响
Keywords: 偏压,阴极电弧离子镀,物理气相沉积,aln薄膜
Abstract:
？在不同基体负偏压作用下,用阴极电弧离子镀等离子体物理气相沉积(pvd)方法在单晶si(100)基片上获得六方晶系的晶态aln薄膜.用x射线衍射仪分析了沉积膜的物相组成和晶格位向随偏压的变化,在扫描电子显微镜(sem)下观察沉积膜的显微组织形貌.结果表明,在较小偏压下,aln膜呈(002)择优取向,表面致密均匀;在较大偏压下,aln膜呈(100)择优取向,表面形貌则粗糙不平.aln薄膜的择优取向及表面形貌受到不同偏压下不同离子轰击能量的影响.
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