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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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反应溅射tio2-xnx膜可见光吸收性能
Keywords: 无机非金属材料,tio2薄膜,n掺杂
Abstract:
？利用中频交流反应磁控溅射方法制备了n掺杂的tio2薄膜。利用光电子能谱(xps)对薄膜的成分进行了分析，并主要研究了薄膜的可见光吸收性能。结果表明：反应气体中n2百分率是影响薄膜中ti－n键的主要因素；在n2气氛中380℃下退火有利于提高n掺杂的含量；厚度的增加使得薄膜的吸收性能在紫外到可见光区都有提高；含n为1.5%的tio2－xnx薄膜吸收限由tio2薄膜的387nm红移至441nm。关键词tio2薄膜、n搀杂、中频交流反应磁控溅射、可见光吸收
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