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OALib Journal期刊
ISSN: 2333-9721
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煅烧温度对in--tio2纳米材料光催化性能的影响
Keywords: 无机非金属材料,热处理,in--tio2,光催化,甲基橙
Abstract:
？采用溶胶--凝胶法合成in掺杂tio2纳米材料,用xrd、ft--ir以及n2吸附--脱附等手段对其表征,研究了热处理条件对其结构和光催化性能的影响。结果表明,在不同煅烧温度制备的材料均由锐钛矿型tio2组成,？且其表面形貌变化不大；随着煅烧温度的提高tio2晶粒尺寸逐渐增大,催化剂的比表面积逐渐降低,孔径逐渐增大。在400℃煅烧制得的3%in--tio2的比表面积为94.4m2/g,平均孔径为10.3nm,具有最强的光催化能力,经光照30min后对甲基橙的光催化降解率为43.1%。
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