OALib Journal期刊
ISSN: 2333-9721
费用:99美元
|
|
|
水性丙烯酸光致抗蚀干膜的合成
Keywords: 光致抗蚀干膜,水溶性丙烯酸树脂,季戊四醇三丙烯酸酯,环保
Abstract:
?采用溶液聚合法合成了水溶性丙烯酸树脂(wbac),将其与季戊四醇三丙烯酸酯(peta)、紫外光引发剂调配制备了水性丙烯酸光致抗蚀干膜。傅里叶红外光谱分析表明,peta和wbac发生了光固化交联反应;光致抗蚀干膜感光层涂膜性能测试表明,经uv固化后涂膜的凝胶率和硬度能显著提高,改善涂膜的耐溶剂性,降低了涂膜的水溶性;gpc和tg分析表明,经uv固化后,光致抗蚀干膜相对分子质量明显变大,耐热性能显著提高。peta和wbac的质量比为0.4时,uv固化后光致抗蚀干膜的水溶性5.54%,乙醇失质量率wy为5.56%,凝胶率和摆杆硬度分别为74.18%和0.71涂膜失质量5%的温度为302.6℃。
References
[1] | 吴坚,张诚.我国电子化学品的现状与发展前景[j].精细与专用化学品,2005,13(23).1-7.
|
[2] | 方志均,陈薇.光致抗蚀干膜技术及其发展[j].感光材料,1990(3):8-12.
|
[3] | zou,mx,zhaoqc,niej.preparationandcharacterizationofpolysiloxanepolyacrylatecompositelatticesbytwoseededemulsionpolymerizationandtheirfilmproperties[j],applpolysci,2007,103,1406-1411.
|
[4] | huangsl,chinwk,yangwp.structuralcharacteristicsandpropertiesofsilica/poly(2-hydroxyethylmethacrylate)(phema)nanocompositespreparedbymixingcolloidalsilicaortetraethyloxysilane(teos)withphema[j].polymer,2005,46:1865-1877.
|
[5] | huangfm,zhanggw,hucp,etal.preparationandcharacterizationofhybridaqueousdispersionscomposedofsilicasolandpoly(styrene-co-acrylate)[j].chem.eng,2005,15(6):816-823.
|
[6] | jongsoonlee,sunghhong.synthesisofacrylicrosinderivativesandapplicationasnegativephotoresist[j].europeanpolymerjournal,2002,38:387-392.
|
[7] | chih-kanglee,trong-mingdon,dar-jonglin.characterizationofacryliccopolymersappliedinnegative-typephotoresistviaaternarycompositiondiagram[j].journalofappliedpolymerscience,2008,109,3467-3474.
|
[8] | hyejincho,junyongkim,prashantpatil.synthesisofsuccinylatedpoly(4-hydroxystyrene)anditsapplicationfornegative-tonephotoresist[j].journalofappliedpolymerscience,2007,103,3560-3566.
|
[9] | lindarjogn,dontrongming,chenchinchung.preparationofananosilica-modifiednegative-typeacrylatephotoresist[j].journalofappliedpolymerscience,2008,107,1179-1188.
|
[10] | chih-kanglee,trong-mingdong.preparationandpropertiesofnano-silicamodifiednegativeacrylatephotoresist[j].thinsolidfilm,2008,516:8399-8407.
|
[11] | larserikschmidt,soyeonyi,youngjim.acrylatedhyperbranchedpolymerphotoresistforultra-thickandlow-stresshighaspectratiomicropatterns[j].journalofmicromechanicsandmicroengineering,2008,18,1-8.
|
[12] | liaoyinyin,liujuihsiang.preparationandcharacterizationofmolecularphotoresist:crosslinkablepositiveandwaterdevelopablenegativetones[j].journalofappliedpolymerscience,2008,109,3849-3858.
|
Full-Text
|
|
Contact Us
service@oalib.com QQ:3279437679 
WhatsApp +8615387084133
|
|