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OALib Journal期刊
ISSN: 2333-9721
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去垢剂影响psⅱ核心复合物稳定性的双重效应
DOI: 10.3724/SP.J.1145.2010.00493, PP. 493-498
Keywords: 去垢剂,光系统ⅱ核心复合物,稳定性,双重效应,叶绿素荧光
Abstract:
光系统（ps）ⅱ核心复合物分离时需要使用去垢剂.研究不同光照条件和去垢剂处理对psⅱ核心复合物荧光发射光谱的影响.结果显示：避光放置时去垢剂存在利于psⅱ核心复合物荧光光谱峰值相对稳定；光照处理引起psⅱ核心复合物荧光光谱峰值下降、峰位蓝移，去垢剂十二烷基麦芽糖苷（dm）存在时荧光光谱变化小于无去垢剂时，而中性去垢剂tritonx-100和阴离子型去垢剂sds存在时变化更为明显.说明光照处理时dm使psⅱ核心复合物稳定性增加，而tritonx-100和sds降低了psⅱ核心复合物的稳定性.避光时去垢剂的增溶作用利于核心复合物的稳定，光照时去垢剂的增溶作用影响色素蛋白，导致叶绿素与蛋白结合状态发生变化，或从蛋白上脱落下来，最终影响到光能的传递.去垢剂的保护或破坏效应与光照强度、去垢剂的种类相关.图7参22
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