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超疏水cf4等离子体改性pvdf膜及其dcmd性能

DOI: 10.3969/j.issn.1671-7627.2012.04.019, PP. 96-100

Keywords: cf4等离子体,表面改性,pvdf膜,膜蒸馏

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Abstract:

采用低温cf4等离子体技术,通过化学气相沉积,将一般疏水聚偏氟乙烯(pvdf)膜表面成功改性为接触角为169.5°±4.9°的超疏水表面,研究改性后的超疏水膜的直接接触式膜蒸馏(dcmd)过程。结果表明:当进料液为4%的nacl溶液时,高温侧温度70.5℃,改性膜通量为26.5kg/(m2·h),截留率高达99.9766%。

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