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甲烷在氧化铁表面还原no的特性与反应机理研究

, PP. 1129-1135

Keywords: no还原,甲烷,氧化铁,反应机理

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Abstract:

?在程序控温电加热水平陶瓷管反应器中,在300~1050℃,对n2气氛中甲烷在氧化铁(充分氧化后的铁丝网卷)表面还原no的特性进行了实验研究,测试了no脱除效率、co生成量以及反应后铁样品表面组分和微观状态的变化特点,分析了甲烷在氧化铁表面还原no的反应机理。在此基础上,在1000℃时,对模拟烟气条件下甲烷在氧化铁表面还原no的持久性进行了实验研究。结果表明,甲烷在氧化铁表面能够高效地还原no。在n2气氛下,在850℃以上达到100%的no脱除效率。在模拟烟气中,甲烷在氧化铁表面脱除no的能力具有很好的持久性。实验结果表明,在1000℃时,采用由体积分数为2.0%的o2、16.8%的co2和524×10-6的no,n2配平的模拟烟气,1.17%ch4能够在连续100h内保持100%的no脱除效率,而未出现下降的趋势。对反应机理的研究结果表明,甲烷在氧化铁表面还原no的机理包括甲烷通过再燃机理还原no以及甲烷通过在氧化铁表面还原氧化铁为金属铁、金属铁进而直接还原no两种主要反应机理。其中,后者为主要反应机理。

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