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新型细晶Ni3Al涂层的制备及其循环氧化行为研究

DOI: doi:10.3969/j.issn.1006-7043.2011.04.025

Keywords: 共电沉积, 退火, Ni3Al, 孔洞, 细晶, 循环氧化, 氧化膜粘附性??

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Abstract:

为提高γ′-Ni3Al合金氧化膜与基体间的粘结力,采用Ni与Al颗粒(平均粒径为1 um)共电沉积,然后600℃真空退火2 h的方法,在普通粗晶Ni3Al合金上制备了一种平均晶粒尺寸为450 nm,孔隙率为6%的Ni3Al涂层.与普通粗晶Ni3Al合金900℃下的循环氧化行为相比,Ni3Al细晶多孔涂层表面能形成一层粘附性良好的连续Al2O3膜,抗循环氧化性能显著提高,这主要是由于涂层的细晶结构避免了氧化时空位在Al2O3膜/基材界面沉积形成大尺寸孔洞,增加了Al2O3膜/基材界面结合强度.

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