PETASCH W, RAUCHLEA E, MUEGGE H, et al. Duo-plasmaline -a linearly extended homogeneous low pressure plasma source[J].Surface and Coatings Technology, 1997, 93(1): 112-118.
[2]
KAISER M, BAUMGARTNERK M, SCHULZA, et al. Linearly extended plasma source for large-scale applications[J].Surface and Coatings Technology,1999,116-119:552-557.
KAISEM, URBAN H, EMMIERICH R,et al. A new linearly extended bifocal microwave plasma device[J]. Surface and Coatings Technology, 2001, 142-144:939-942.
[5]
MOTT S H. The theory of collectors in gaseous discharges[J]. Phys Rev, 1926,28(4): 727.
[6]
FEICHTINGER J, SCHULZ A, WALKER M, et al. Sterilisation with low-pressure microwave plasmas[J]. Surface and Coatings Technology, 2003,9-10:564-569.
[7]
DOGGETT B, BUDTZJ C, LUNNEY J G, et al. Behaviour of a planar Langmuir probe in a laser ablation plasma[J]. Applied Surface Science, 2005,247(1-4): 134-138.
[8]
HE Y L, LIU X M, WANG Z C. Study of nano-crystalline silicon films[J]. Science China A,1992(9):995-1021.
[9]
YUE H Y, WU A M, ZHANG X Y, et al. New two-step growth of microcrystalline silicon thin films without incubation layer[J]. Journal of Crystal Growth, 2011,322(1):1-5.
[10]
ZHANG X Y, WUA M, SHI S F, et al. Influence of Ar/H2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition[J]. Thin Solid Films, 2012, 521(10):181-184.
