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液相外延p型碲镉汞表面区与腐蚀凹坑的不同扫描隧道谱特征

Keywords: 碲镉汞,扫描隧道显微镜,半导体能谱

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Abstract:

利用超高真空扫描隧道显微镜对经过溴甲醇溶液腐蚀处理的液相外延碲镉汞材料进行了表征.发现经过腐蚀处理(3%浓度,2.5min)的样品表面出现高密度的凹坑结构,凹坑深度约几十纳米,横向尺度在几十到几百纳米之间.扫描隧道谱测量表明,腐蚀样品表面平坦区呈现较大表观带隙,需考虑针尖诱导的能带弯曲效应,而凹坑区在零偏压区的扫描隧道谱线则近似为线性变化,说明该区域包含较高的带隙态并直接参与隧穿,从而掩盖了带隙信息.

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