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甲烷流量对8.5代非晶硅光伏组件P层材料结构和光学性质的影响

Keywords: 非晶碳化硅,红外光谱,均匀性,甲烷流量

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Abstract:

本文研究了甲烷流量对作为工业非晶硅光伏组件的p层材料—非晶碳化硅结构和光学性质的影响.p层非晶碳化硅薄膜采用硅烷和甲烷混合气体在射频等离子体增强化学气相沉积(RF-PECVD)设备中沉积制得,该设备是应用材料公司制造的尺寸为2.2m×2.6m的8.5代系统.采用红外光谱和透射/反射谱分析与沉积工艺相关的键结构和光学性质.相同工艺条件下,当甲烷含量从3000sccm增加到8850sccm,p层非晶碳化硅薄膜的光学带隙逐步增加.p层非晶碳化硅薄膜的沉积速率随甲烷流量的增加而逐渐减小,其原因是硅烷-甲烷等离子体中SiH3粒子的减少.文中还通过在不同位置取样和分析沉积速率研究了大面积薄膜的均匀性.

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