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Au/CdTe+ZnS/HgCdTe双层介质膜MIS器件的制备及研究

Keywords: CdTe薄膜,HgCdTe红外焦平面,器件表面钝化,ZnS.

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Abstract:

通过介质膜ZnS、CdTe薄膜材料的Ar+束溅射沉积研究,结合HgCdTe器件工艺,成功制备了以ZnS、CdTe双层介质膜为绝缘层的HgCdTeMIS器件;通过对器件的C-V特性实验分析,获得了CdTe/HgCdTe界面电学特性参数.实验表明溅射沉积介质膜CdTe+ZnS对HgCdTe的表面钝化已经可以满足HgCdTe红外焦平面器件表面钝化的各项要求.

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