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As在HgCdTe分子束外延中的表面粘附系数

Keywords: 二次离子质谱,分子束外延,碲镉汞,砷掺杂

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Abstract:

报道了用二次离子质谱分析(SIMS)方法对As在碲镉汞分子束外延中的掺入行为的研究结果.发现As在CdTe、HgCdTe表面的粘附系数很低,并与Hg的介入密切相关.对于单晶HgCdTe外延,在170℃生长温度下As的粘附率相对于多晶室温淀积仅为3×10-4,在此生长温度下,通过优化生长条件获得了表面形貌良好的外延材料.通过控制As束源炉的温度可以很好地控制As在HgCdTe层中的原子浓度.

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