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氮化镓薄膜中LO声子—等离子体激元耦合模拉曼光谱研究

Keywords: 氮化镓薄膜拉曼光谱等离子体激元声子耦合模测量半导体

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Abstract:

对生长在蓝宝石衬底上不同Si掺杂浓度的一系列GaN外延膜进行了拉曼散射光谱测量,观察到清晰的LO声子-等离子体激元耕合模的高频支(LPP+)和低频支(LPP-)及其随掺杂浓度的增加往高频方向的移动,通过进行理论计算和拟合,得到GaN中的等离子体激元的频率及阻尼常数,并由此计算得到GaN中的载流子浓度和迁移率,与红外反射谱测量得到的数据进行了比较,结果表明,2种光谱方法得到的载流子浓度均与霍耳测量相一致。但迁移率比霍耳迁移率要低,接近杂质散射机制下的漂移迁移率。

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