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异质界面数字梯度超晶格对扩展波长InGaAs光电探测器性能的改善

Keywords: 数字梯度超晶格,InP缓冲层,位错

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Abstract:

采用气态源分子束外延方法生长了三种不同结构的扩展波长(室温下50%截止波长为2.4μm)In_xGa_(1-x)As光电探测器材料,并制成了台面型器件.材料的表面形貌、X射线衍射摇摆曲线及光致发光谱表明,在InAlAs/InGaAs异质界面处生长数字梯度超晶格可以明显提高材料质量;器件在室温下的暗电流结果显示,直径为300μm的器件在反向偏压为10mV时,没有生长超晶格结构的器件暗电流为0.521μA,而生长超晶格结构的器件暗电流降到0.480μA.同时,在生长In_xAl_(1-x)As组分线性渐变缓冲层之前首先生长一层InP缓冲层也有利于改善材料质量和器件性能.

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