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递推混合最小二乘在红外焦平面阵列非均匀校正中的应用

Keywords: 红外焦平面阵列,非均匀校正,固定图案噪声,递推最小二乘,递推混合最小二乘

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Abstract:

基于递推最小二乘(RLS)的红外焦平面阵列非均匀校正算法具有计算量和存储量小等优点,易于工程实现.但RLS并不完全满足实际问题模型的要求,因此拟合出的噪声参数存在严重偏差.提出了一种利用递推混合最小二乘(RMLS)替代RLS进行非均匀校正的算法,它不但具有原方法的各种优点,而且由于符合问题模型的基本特征,因此在拟合精度和收敛速度方面都优于RLS.文中实验结果也验证了该方法的有效性.

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