Torrance J B, Lacorre R, Nazzal A I. Systematical study of insulator-metal transitions in perovskites RNiO3 (R = Pr, Nd, Sm, Eu) due to closing of charege-transfer gap [ J ]. Phys.Rev. B, 1992, 45: 8209
[2]
Von Helmolt R, Wecker J, Holzapfel R, et al. Giant negative magnetroresistance in perovskitelike La2/3 Ba1/3 MnOx ferromagnetic films[J]. Phys. Rev. Lett., 1993, 71:2331
[3]
Ramesh R, Aggarwal S, Auciello O. Science and technology of ferroelectric films and heterostructures for no-volatile ferroelectric memories [J]. Materials Sci. and Eng. R: Report, 2001,32:191
[4]
Batzer, BiMing Yen, Donhang Liu, et al. A high-temperature x-ray-diffraction study of epitaxial PbTiO3 thin films[J]. J. Appl. Phys. , 1996, 80:6235
[5]
Floquet N, Hector J, Gaucher P. Correlation between structure microstructure and ferroelectric properties of PbZr0.2 Ti0.8 O3 integrated film: influence of the sol-gel process and the substrate[J]. J. Appl. Phys. , 1998, 84:3815
[6]
Reza Moazzami. Ferroelectric thin film technology for semiconductor memory[ J]. Semicond. Sci. Technol. , 1995, 10:375
[7]
Kyuseog Hwang, Yongmu Lim, Byunghoon Kim. Epitaxially grown LaNiO3 thin films on SrTiO3 (100) substrates by the chemical solution method [ J ]. Materials Research Bulletin, 2000, 34: 2069
[8]
Krishna Seshan, Stephen Rossnagel. Handbook of Thin Film Deposition Processes and Technologies[ M]. 2nd edition,USA: Noyes Publications, Norwich, N.Y. , 2002: 323
[9]
Wu W, Wong K H, Chan P W. Epitaxial growth of α-axis oriented YBa2Cu3O7-y/LaNiO3 heterostructures on (100)SrTiO3 by pulsed laser deposition [ J ]. Physica C, 1998,297: 247
[10]
Chen M S, Wu T B, Wu J M. Effect of textured LaNiO3 electrode on the fatigue improvement of Pb ( Zr0.53 Ti0.47 ) O3thin films[J]. Appl. Phys. Lett., 1996, 68:1430
[11]
Sanchez F, Ferrater C, Alcobeé X, et al. Pulsed laser deposition of epitaxial LaNiO3 thin films on buffered Si ( 100 )[J]. Thin Solid Films, 2001,384:200
[12]
Yang C C, Chen M S, Hong T J, et al. Preparation of (100)-oriented metallic LaNiO3 thin films on Si substrates by rf-magnetron sputtering for the growth of textured Pb ( Zr0.53 Ti0.47 ) O3 [ J ]. Appl. Phys. Lett., 1995, 66: 2643
