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核技术  2015 

偏置条件对NPN型锗硅异质结双极晶体管电离辐射效应的影响

DOI: 10.11889/j.0253-3219.2015.hjs.38.060202, PP. 60202-60202

Keywords: 锗硅异质结双极晶体管,总剂量效应,偏置条件,退火

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Abstract:

本文研究了不同偏置条件下国产商用NPN型锗硅异质结双极晶体管(Silicongermaniumhetero-junctionbipolartransistors,SiGeHBTs)在60Coγ辐射环境中电离辐照响应特性和变化规律。实验结果表明,在0.8Gy(Si)?s?1剂量率辐照下,总累积剂量达到1.1×104Gy(Si)时,发射结反向偏置条件下60Coγ射线辐照对SiGeHBTs造成的损伤最大,零偏次之,正偏损伤最小;经过一定时间的退火后,零偏恢复程度最小,而正偏和反偏时的恢复趋势以及程度相同。分析了不同偏置状态下其电离辐照敏感参数随累积总剂量以及退火时间的变化关系,讨论了引起电参数失效的潜在机理。

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