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nc-Si/SiO2复合膜的非线性光学性质

DOI: 10.3969/j.issn.1000-5013.2007.03.006

Keywords: nc-Si/SiO2复合膜, 简并四波混频, 光学非线性, 三阶极化率

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Abstract:

采用等离子体增强化学气相淀积(PECVD)技术,制备a-SiOx∶H(0

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