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材料工程  2013 

添加剂和电流密度对镍钴合金电铸层组织结构的影响

DOI: 10.3969/j.issn.1001-4381.2013.06.004, PP. 18-24

Keywords: 电铸镍钴合金,添加剂,电流密度,应力,钴含量,组织形貌

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Abstract:

研究了添加剂、电流密度对镍钴合金电铸层应力和钴含量的影响。采用SEM、能谱仪和X射线衍射分析了添加剂和电流密度对铸层形貌及微观结构的影响。结果表明添加剂TN2能够使铸层产生压应力;TN3能够使铸层产生张应力,TN3与TN2配合使用,能够使铸层应力达到平衡值零。电流密度增加时,当电流密度小于6A/dm2时,铸层应力随之增加;当电流密度大于6A/dm2时,铸层应力随之减小。添加剂对铸层钴含量影响不明显而电流密度对铸层钴含量的影响较明显;TN2,TN3的加入能够使铸层更平滑、晶粒细致紧密。添加剂TN2对衍射峰(200)影响较大,对晶面具有一定的选择性;添加剂TN3对晶面具有较强的选择性,易在(200)面吸附,抑制其生长,此时晶体的生长方向主要为[100]。随着电流密度的增大,衍射峰出现宽化的趋势。

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