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材料工程  2015 

Ta/Pt双底层Co/Ni多层膜的反常霍尔效应

DOI: 10.11868/j.issn.1001-4381.2015.11.004, PP. 19-23

Keywords: Co/Ni多层膜,反常霍尔效应,垂直磁各向异性

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Abstract:

通过JGP560A型磁控溅射仪制备了一系列以Ta/Pt为底层的Co/Ni多层膜样品,研究了多层膜中Pt缓冲层厚度、周期层中Co与Ni厚度以及多层膜周期数对样品反常霍尔效应和磁性的影响。结果发现逐渐增厚的Pt层可以使样品的矫顽力增加,但是分流作用会导致样品的霍尔电阻降低,通过比较确定Pt缓冲层的厚度为2nm;磁性层中Co和Ni都处于一定厚度范围内时,多层膜的霍尔回线才能具有良好的矩形度,当厚度超出其特定范围时,多层膜的矩形度会变差,经过分析确定磁性层中Co和Ni的厚度为均0.4nm;磁性层的周期数对样品的性能也有着显著的影响,最终通过对周期数优化获得的最佳样品结构为Ta(2nm)Pt(2nm)Co(0.4nm)Ni(0.4nm)Co(0.4nm)Pt(1nm),该样品的霍尔回线矩形度非常好,霍尔信号明显,该样品总厚度在7nm以内,可进一步研究其在垂直磁纳米结构中的应用。

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