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寻求最终亚-50纳米CMOS器件结构(英文)

, PP. 51-54

Keywords: CMOS器件,非典型结构,晶体管结构

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Abstract:

主要介绍了对各种非典型CMOS结构的研究,从而寻求最终的结构模式适应不断变化的CMOS发展技术.

References

[1]  [ Wong H S P. Design and performance considerations for sub-0. 1μm doube-l gate SOI MOSFETs[ A] . International Electronic Device Meeting, 1994.
[2]  [ Wong H S P, Chan K K, Taur Y. Sel-f aligned doube-l gate MOSFET with a 25 nm thick channel[ A] . International Electronic Device Meeting, 1997. 427~ 430.
[3]  [ Wong H S P, Frank D J, Solomon P M. Device design considerations for double-gate, ground plane, and single- gated ultra- thin SOI MOSFETs at the 25 nm channel length[ A] . International Electronic Device Meeting, 1998. 407~ 410.

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