全部 标题 作者
关键词 摘要

OALib Journal期刊
ISSN: 2333-9721
费用:99美元

查看量下载量

相关文章

更多...

先驱体法制备连续SiC自由薄膜及其发光性能

Full-Text   Cite this paper   Add to My Lib

Abstract:

以聚碳硅烷(polycarbosilane,PCS)为先驱体,熔融纺出连续PCS自由原膜,并在190℃下对其进行1,2,3h和6h氧化交联,在900℃预烧及最终分别在1200℃和1300℃烧成,制得系列SiC自由薄膜。采用红外光谱、Raman光谱、X射线衍射、透射电镜与扫描电镜对薄膜进行微观结构与形貌分析。测量了薄膜的室温光致发光特性。结果表明连续SiC自由膜均匀致密,含有β-SiC微晶、无定形SiOxCy及C簇;薄膜在410~450nm范围内有较强的蓝光发射,1200℃烧结的薄膜随交联时间增加,发光强度增大;而1300℃烧结的薄膜的发光强度相对下降,且交联时间越长强度下降越明显。412nm发光峰可归结于C簇发光;而435nm附近的峰则是薄膜中富含的Si—O,Si—C等键中的缺陷态构成的发光中心,在β-SiC晶粒中电子受到激发与缺陷态产生辐射复合引起发光以及量子表面效应共同作用的结果。

References

[1]  MCNUTT T,HEFNER A,MANTOOTH A,et al.Compact models for silicon carbide power devices[J].Solid State Electron,2004,48(10-11):1757-1762. [2]PANDRAUD G,FRENCH P J,SARRO P M.Fabrication and charac-teristics of a PECVD SiC evanescent wave optical sensor[J].Sens Ac-tuators A:Phys,2008,142(1):61-66. [3]IKEDDA M,HAYAKAWA T,YAMAGIWA S,et al.Fabrication of6H-SiC light-emitting diodes by a rotation dipping technique:Elec-troluminescence mechanisms[J].J Appl Phys,1979,50(12):8215-8225. [4]RAJAB S M,OLIVEIRA I C,MASSI M,et al.Effect of the thermal annealing on the electrical and physical properties of SiC thin films produced by RF magnetron sputtering[J].Thin Solid Films,2006,515(1):170-175. [5]SUZUKI H,ARAKI H,TOSA M,et al.SiC film formation from fluorosilane gas by plasma CVD[J].J Cryst Growth,2006,294(2):464-468. [6]MAGAFAS L.The effect of thermal annealing on the optical properties ofα-SiC:H films[J].J Non-Cryst Solids,1998,238(1-2):158-162. [7]YAJIMA S,OKAMURA K,HAYASHI J,et al.Synthesis of continuous silicon carbide fibers with high tensile strength[J].J Am Ceram Soc,1976,59(7-8):324-327. [8]YAJIMA S,HASEGAWA Y,OKAMURA K,et al.Development of high tensile strength silicon carbide fiber using an organosilicon polymer precursor[J].Nature,1978,273(5663):525-527. [9]LIAO L S,BAO X M,YANG Z F,et al.Intense blue emission from porousβ-SiC formed on C+-implanted silicon[J].Appl Phys Lett,1995,66(18):2382-2384. [10]YU M B,RUSLI,YOON S F,et al.Hydrogenated nanocrystalline silicon carbide films synthesized by ECR-CVD and its intense visible photoluminescence at room temperature[J].Thin Solid Films,2000,377-378:177-181. [11]CHAO D,ZOU G F,LIU E,et al.Synthesis of kelp-like crystallineβ-SiC nanobelts and their apical growth mechanism[J].J Am Ceram Soc,2007,90(2):653-656. [12]余煜玺.含铝碳化硅纤维的连续化制备与研究[D].长沙:国防科学技术大学,2005.YU Yuxi.Preparation and investigation of continuous aluminum-con-taining silicon carbide fibers(in Chinese,dissertation).Changsha:Na-tional University of Defense Technology,2005. [13]程祥珍,肖加余,谢征芳,等.聚碳硅烷纤维的不熔化与SiC纤维制备研究[J].材料工程,2004(1):29-32.CHEN Xiangzhen,XIAO Jiayu,XIE Zhengfang,et al.J Mater Eng(in Chinese),2004(1):29-32. [14]王艳艳,张立同,唐学原,等.退火温度对Hi-Nicalon SiC纤维微观结构及力学性能的影响[J].硅酸盐学报,2005,33(3):263-267.WANG Yanan,ZHANG Litong,TANG Xueyuan,et al.J Chin Ceram Soc(in Chinese),2005,33(3):263-267. [15]王浩,李效东,彭平,等.影响SiC陶瓷纤维力学性能的因素评价[J].宇航材料工艺,2001(3):4-14.WANG Hao,LI Xiaodong,PENG Ping,et al.Aerosp Mater Technol(in Chinese),2001(3):4-14. [16]HE G W,SHIBAYAMA T,TAKAHASHI H.Microstructural evolution of Hi-NicalonTM SiC fibers annealed and crept in various oxygen par-tial pressure atmospheres[J].J Mater Sci,2000,35:1153-1164. [17]YAO R Q,WANG Y Y,FENG Z D.The effect of high-temperature annealing on tensile strength and its mechanism of Hi-Nicalon SiC fi-bres under inert atmosphere[J].Fatigue Fract Eng Mater Struct,2008,31(9):777-787. [18]SHA Z D,WU X M,ZHUGE L J.Structure and photoluminescenceproperties of SiC films synthesized by the RT-magnetron sputtering technique[J].Vacuum,2005,79:250-254. [19]ZHUGE L J,WU X M,LI Q,et al.Origin of violet photoluminescence in SiO2films co-doped with silicon and carbon[J].Physics E,2004,23(1-2):86-91. [20]MORALES R M,DIAZ C A,TORCHYNSKA T V,et al.Size de-pendent photoluminescence of SiC nanocrystals[J].J Non-Cryst Solids,2008,354(19-25):2272-2275. [21]张志敏,谢二庆,林洪峰,等.多孔β-SiC薄膜的蓝光发射[J].半导体学报,2003,24(9):942-945.ZHANG Zhimin,XIE Erqing,LIN Hongfeng,et al.Chin J Semiconduct(in Chinese),2003,24(9):942-945.

Full-Text

Contact Us

service@oalib.com

QQ:3279437679

WhatsApp +8615387084133