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高岭石/聚苯乙烯插层复合物碳热还原反应制备碳化硅晶须/氧化铝复相陶瓷粉体

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Abstract:

以二甲基亚砜(dimethylsulfoxide,DMSO)为插层剂制得高岭石/DMSO插层复合物,将苯乙烯单体与高岭石/DMSO插层复合物进行置换反应,成功地将苯乙烯单体引入高岭石层间,层间苯乙烯在加热条件下聚合,制得高岭石/聚苯乙烯插层复合物。以高岭石/聚苯乙烯插层复合物为原料,在氩气保护气氛下,于1500℃碳热还原反应制备碳化硅晶须/氧化铝(SiCw/Al2O3)复相陶瓷粉体。结果表明在高岭石/聚苯乙烯插层复合物中,高岭石的层间距由0.717nm扩张到1.130nm,插层率接近100%,插层作用影响了层间羟基基团的振动,使其键合方式发生改变。X射线衍射和扫描电镜分析表明合成出SiCw/Al2O3复相陶瓷粉体中SiC和Al2O3为主晶相,SiC呈晶须状,其直径≤200nm,长度≥3μm。

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