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聚焦磁光克尔效应研究坡莫合金图形阵列中的局部磁性

, PP. 492-497

Keywords: 激光物理,磁各向异性,聚焦磁光克尔效应,图形化阵列,化学湿蚀刻

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Abstract:

利用聚焦磁光克尔效应(MOKE)研究了不同形状单元组成的坡莫合金图形化阵列的单个单元磁化过程,研究发现单元的形状对单元磁性有很大影响,主要是单元的退磁场和形状有很大关联。研究还发现矩形阵列单个单元的磁滞回线不但与其矩形比有关,与单元间隔和在阵列中的阵列位置也有关。矩形单元易磁化方向沿着其长边方向,而短边方向为难磁化方向,其形状磁各向异性随矩形比而增大。当阵列单元之间的间隔大于单元尺寸时,在阵列中单元的位置对磁性影响相对较少,基本与单个单元的磁性相同。当单元之间的间隔接近单元尺寸时,不同位置的单元的磁性表现出磁各向异性不同,表明单元间的磁相互作用对磁性产生影响。

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