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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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纳米SiO2表面基团在MMA原位本体聚合中的阻缓聚作用
DOI: 10.11777/j.issn1000-3304.2015.14212, PP. 213-220
Keywords: 纳米SiO2,表面改性,分子量,阻缓聚作用
Abstract:
分别以3-(甲基丙烯酰氧)丙基三甲氧基硅烷(MPS)和辛基三甲氧基硅烷(OTMS)为活性和惰性硅烷的代表,对SiO2进行不同锚固密度的表面修饰,并以改性SiO2的甲基丙烯酸甲酯(MMA)单体分散液为原料,通过原位本体聚合制得一系列SiO2含量不同的高分散性SiO2/PMMA复合材料.考察SiO2表面基团活性程度和SiO2含量对聚合反应动力学、基体聚合物分子量以及复合材料硬度的影响,探究修饰状态不同SiO2在本体自由基聚合中的作用机制.发现SiO2表面硅羟基及其锚固MPS的活性双键会对聚合反应起阻缓聚作用,进而会显著降低基体聚合物的分子量及复合材料的硬度.而惰性硅烷OTMS对SiO2表面的锚固则会消耗SiO2表面硅羟基、并屏蔽其影响,因而随着OTMS锚固密度的提高,基体分子量和复合材料硬度均会随之提高,特别是当表面修饰达到饱和状态时,SiO2的阻缓聚作用已可忽略.
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