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PS模板法制备铜纳米颗粒

Keywords: 多孔硅(PS)模板,浸渍沉积,铜纳米颗粒

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Abstract:

采用双槽电化学腐蚀法制备多孔硅(poroussilicon,PS),对其进行超声后处理.以PS为模板采用一步浸渍沉积法制备大小均匀、形状规则的铜纳米颗粒,并研究沉积时间对纳米颗粒形状、尺寸的影响.结果表明:PS超声后处理并未造成其物理和化学结构的破坏,大量的硅氢键(SiHx)和蜂窝状多孔结构(直径150nm左右)分别为纳米铜的形成和生长提供了还原剂和场所;沉积时间对铜纳米颗粒形貌具有重要影响,当沉积时间为40s时得到形状和尺寸较为均匀的铜纳米颗粒.

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