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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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氮气辅助氙离子束增强沉积TiN薄膜及其机械性能
, PP. 87-91
Keywords: TiN薄膜,离子束增强沉积
Abstract:
本文提出一个合成TiN硬质薄膜的新方法,在氮气氛中,电子束蒸发沉积Ti的同时,用40keV的氙离子束对其进行轰击而合成TiN薄膜,该方法优于PVD和CVD之处在于合成温度低,薄膜与基体结合力强,其临界载荷达4.2kg,Knoop硬度达2200kg/mm~2,具有良好的耐磨损性能,报道了所合成的TiN薄膜在工业上应用的一些结果。
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