OALib Journal期刊
ISSN: 2333-9721
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氮含量对脉冲偏压电弧离子镀CNx薄膜结构与性能的影响
, PP. 917-921
Keywords: 氮化碳薄膜,脉冲偏压,电弧离子镀,结构,性能
Abstract:
用脉冲偏压电弧离子镀设备在保持脉冲偏压一致和工作气压恒定的条件下,控制不同氮流量在硬质合金基体上制备了不同氮含量的CNx薄膜.用SEM,GIXRD,XPS,激光Raman谱和纳米压入等方法分别研究了薄膜的表面形貌、成分、结构与性能.结果表明,随着氮流量的增加,薄膜中氮含量先是线性增加然后趋于平缓,薄膜呈非晶结构且为类金刚石薄膜,其硬度与弹性模量随着氮含量增加先增加后下降,在x=0.081时出现最大值,分别为32.1GPa和411.8GPa.分析表明,通过氮含量的改变而使sp3键含量发生改变是影响薄膜性能变化的重要因素.
References
[1] | WWang E G.Prog Mater Sci,1997;41:241
|
[2] | WWidlow I,Chung Y W.Int Mater Rev,2002;47:153
|
[3] | SStephen M,Juan M M.Diamond Relat Mater,1999;8: 1809
|
[4] | MMartin P J,Bendavid A.Thin Solid Films,2001;394:1
|
[5] | LLin G Q,Zhao Y H,Guo H M,Wang D Z,Dong C,Huang R F,Wen L S.J Vac Sci Technol,2004;22:1218
|
[6] | ZZhou Z M,Xia L F.Surf Coat Technol,2003;172:102
|
[7] | HHammer P,Victoria N M,Alvarez F.J Vac Sci Technol, 2000;18:2277
|
[8] | TTian X M,Adhikari S,Adhikary S,Uchida H,Umeno M, Soga T,Jimbo T.Diamond Relat Mater,2005;14:1839
|
[9] | SShi J R.J Appl Phys,2006;99:1
|
[10] | Hainsworth S V,Uhure N J.Int Mater Rev,2007;52:153
|
[11] | Li L H,Wu Y Q,Cui X M,Zhang H Q,Zhang Y H,Xia L F,Chu P K.Acta Metall Sin,2004;40:220 (李刘合,武咏琴,崔旭明,张海泉,张彦华,夏立芳,朱剑豪.金属学报,2004;40:220)
|
[12] | Ferrari A C.Diamond Relat Mater,2002;11:1053
|
[13] | Zou Y S,Wang W,Zheng J D,Sun C,Huang R F,Wen L S.Acta Metall Sin,2004;40:537 (邹友声,汪伟,郑静地,孙超,黄荣芳,闻立时.金属学报,2004;40:537)
|
[14] | Bai H L,Jiang E Y,Wu P,Wang Y,Wang C D.Acta Metall Sin,1999;35:762 (白海力,姜恩永,吴萍,王怡,王存达.金属学报,1999;35:762)
|
[15] | Robertson J.Mater Sci Eng,2002;R37:129
|
[16] | Silva S R P,Robertson J,Amaratunga G A J,Rafferty B, Brown L M,Schwan J,Franceschini D F,Mariotto G.J Appl Phys,1997;81:2626
|
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