OALib Journal期刊
ISSN: 2333-9721
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Cu-Bi合金偏析的原子模拟Ⅰ.饱和偏析
, PP. 1-5
Keywords: 偏析,原子模拟,Cu-Bi合金
Abstract:
本文研究了不同含量的Bi偏析于Cu的∑=5B(210)/〔001〕对称倾转晶界的原子结构.本文发现最重要的结构效应,是不同原子位置的偏析能的强烈不均匀性,以及在晶界区形成二维有序合金结构.并发现1.25单层是饱和偏析浓度.
References
[1] | 1 Hondros E D. Philos Mag, 1974; 29: 771
|
[2] | 2 Powell B D, Woodruff D P. Philos Mag, 1976: 34: 169
|
[3] | 3 Donald A. Philos Mag, 1976; 34: 1185
|
[4] | 4 Bishop G H, Hart W H, Bruggeman G A.,Acta Metall. 1971; 19: 37
|
[5] | 5 Joshi A. In: Johoson W C, Blakely J W eds., Interfacial Segregation, Ohio: ASM, 1979: 39
|
[6] | 6 Chang H K, Lee J K. Stein D F. In: Lee J K ed., Interatomic Potentials and Ctystalline Defects, AIME, 1981: 373
|
[7] | 7 Maeda K, Vitek V, Sutton A P. Acta Metall, 1982: 30: 2001
|
[8] | 8 Sutton A P, Vitek V. Acta Metall 1982; 30: 2011
|
[9] | 9 Vitek V, Minonishi Y. Surf Sci. 1984; 144: 196
|
[10] | 10 Sutton A P. Ph D thesis, University of Pennsylvania. 1981
|
[11] | 11 Wang G J. Ph D thesis, University of Pennsylvania, 1984E
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