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OALib Journal期刊
ISSN: 2333-9721
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Si和Y掺杂对(Ti,Al)N涂层结构和性能的影响
DOI: 10.3724/SP.J.1037.2011.00292, PP. 99-106
Keywords: 磁控溅射,(Ti,Al)N,Si和Y掺杂,抗氧化性能,硬度,结合力
Abstract:
分别在未施加偏压和施加-100V偏压条件下,利用磁控溅射技术在压气机叶片用1Cr11Ni2W2MoV热强不锈钢基体上沉积了Ti0.3Al0.7N和Ti0.39Al0.55Si0.05Y0.01N硬质涂层.实验结果表明,施加偏压及Si和Y掺杂明显改变了涂层的相结构,提高了涂层致密度,施加-100V偏压且添加Si和Y的涂层为非晶结构,表面更加均匀致密.950℃氧化实验表明Ti0.39Al0.55Si0.05Y0.01NN涂层表面形成极薄且致密的Al2O3保护性氧化膜,大大降低了氧化速率.施加-100V偏压的(Ti,Al)N和(Ti,Al,Si,Y)N沉积态涂层与未施加偏压的相应涂层相比,硬度均降低,尤其是(Ti,Al,Si,Y)N涂层变化显著.经950℃热处理,施加偏压的(Ti,Al,Si,Y)N涂层硬度略有降低,这是由于形成了硬度较低的B4相,而未施加偏压的(Ti,Al,Si,Y)N涂层硬度显著提高,这归因于B1相固溶体的分解.划痕测试结果表明,在实验载荷(50N)下,所有涂层均未出现连续性的剥落.
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