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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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Mo/SiO_2软X射线多层膜反射镜的界面分析
, PP. 737-741
Keywords: Mo／SiO_2多层膜,磁控溅射,同步辐射,低角X射线衍射,俄歇电子能谱
Abstract:
用X射线衍射的动力学理论对磁控溅射法制备的Mo／SiO2多层膜低角X射线衍射谱进行拟合，定量分析了膜层的周期结构和界面粗糙度．同时，用Auger电子能谱证实了多层膜成分的周期性以及比较明晰的层界面随样品厚度的增加，界面粗糙度增加．
| [1] | 1 Chakrabotry P. Int J Mod Phys, 1991; B 5: 2133
|
| [2] | 2 Eason R W. TechnicaI Report of Ruther.brd Appleton Laboratory, A4, 1987: 1
|
| [3] | 3 Okada H, Mayama K, Goto Y, Kusunoki L, Yanagihara M. Appl Opt, 1994; 33: 4219
|
| [4] | 4 Berning P H. Phys Thin Fdms, 1963, 1. 69
|
| [5] | 5 Underwood J H, Barbee T W Jr. AIP Conf Proc, 1981, (75): 170
|
| [6] | 6 Henke B L, Lee P, Tanaka T J, Shimabukuro R L, Fuiikawa B K. A,omic Data and Nuclear Data
|
| [7] | TabIe, Vol.27, New York' Academic Press, 1982: 1
|
| [8] | 7 Li Z G, Smith D J, Tsen S-C Y, Boher P, Houdy Ph. J Appl Phys, 1991; 70: 2905
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