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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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硅烷膜的电化学辅助沉积及其防护性能
, PP. 295-298
Keywords: 铝合金,防腐蚀,硅烷膜,电化学辅助沉积
Abstract:
采用电化学辅助技术在LY12铝合金表面沉积了两种防护性硅烷膜（1,2-二-(三乙氧基硅基)乙烷（BTSE）、十二烷基三甲氧基硅烷（DTMS））。电化学阻抗谱测试结果显示，经硅烷化处理后铝合金的耐蚀性能得到大幅度提高，并且发现在阴极电位下沉积所得硅烷膜的耐蚀性能较常规“浸涂法”有明显提高；同时发现对两种硅烷膜而言，均存在一个最佳的“临界阴极电位”（-0.8V），在此电位下制得膜的耐蚀性最佳。扫描电镜观察显示该“临界电位”下所得硅烷膜最为完整致密，电位较正不利于成膜，而电位继续变负膜表面呈现多孔形貌，可能与氢气的生成并溢出破坏表面有关。由于在硅烷分子中含有疏水性较强的十二烷基长链，DTMS膜具有更高的耐蚀性。
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