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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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纳米结构黑镍薄膜的电沉积机理
DOI: 10.3724/SP.J.1037.2010.00268, PP. 123-128
Keywords: 纳米晶黑镍薄膜,电镀,循环伏安,电化学阻抗谱
Abstract:
采用直流电沉积技术在改性的Watt镀镍溶液中获得了纳米晶黑镍薄膜,采用SEM和XRD对薄膜的表面形貌和相组成进行了表征,采用循环伏安法和电化学阻抗谱对黑镍薄膜的初始电沉积行为进行了研究.结果表明,黑镍薄膜表面平整光亮,具有纳米晶结构;黑镍薄膜的电沉积过程遵循3D成核/生长机制;随着阴极沉积电势(负偏压)的增大,黄铜电极表面Ni的电沉积反应\linebreak由UPD沉积、异质成核/生长转化为最终的同质成核/生长,相应的电荷转移电阻Rt的值先增大然后减小;在较高的阴极沉积电势作用下,由于吸附H原子(H2分子)的结晶阻止作用和(镍)羟基化合物的吸附作用,电沉积EIS图出现低频和超低频感抗弧.
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