|
OALib Journal期刊
ISSN: 2333-9721
费用：99美元
|
|
|
|
用溶致液晶模板合成与组装纳米材料*
Keywords: 纳米材料,溶致液晶,模板,合成,组装
Abstract:
总结了溶致液晶作模板合成与组装纳米材料的各种方法,特别分析了近来兴起的以溶致液晶为构建支架,以纳米粒子为构建单元制备无机/有机杂合体的特点,并对未来发展趋势作了展望.
| [1] | [ 2 ] Wang Z L , Gao R P, Poncharal P, et al. Materials Science and Engineering C, 2001, 16 (1/2 ) : 3—10
|
| [2] | [ 5 ] Smith S S. N ano L ett. , 2001, 1 (2) : 51—56
|
| [3] | [ 9 ] Zhou Y K, Huang J , Shen C M , et al. M aterials Science and Engineering A , 2002, 335 (1/2) : 260—267
|
| [4] | [ 10 ] Gao F, L u Q Y, L iu X Y, et al. N ano L ett. , 2001, 1(12) : 743—748
|
| [5] | [ 11 ] Ravaine S, Fanucci G E, Seip C T, et al. Langmuir,1998, 14: 708—713
|
| [6] | [ 12 ] Khomutov G B, Bykov IV , Gainutidinov R V , et al. Colloids and Surfaces A , 2002, 198/200: 347—358
|
| [7] | [ 17 ] Coleman N R B, Attard G S. Micropo rous and Mesoporous Materials, 2001, 44/45: 73—80
|
| [8] | [ 22 ] 王良御(Wang L Y) , 廖松生(Liao S S). 液晶化学(Liquid Crystal Chemsitry). 北京(Beijing) : 科学出版社(Science Press) , 1988. 138—149
|
| [9] | [ 24 ] Gulik-Krzyw ick i T, Dedieu J C, Roux D, et al. L angmuir, 1996, 12 (20) : 4668—4671
|
| [10] | [ 26 ] Ponsinet V , Talmon Y. Langmuir, 1997, 13 (26) : 7287—7292
|
| [11] | [ 29 ] Jiang X C, Xie Y, L u J , et al. Chem. M ater. , 2001, 13(4) : 1213—1218
|
| [12] | [ 1 ] Simon U , FrankeM E. Microporousand Mesoporous Materials, 2000, 41 (1/3) : 1—36
|
| [13] | [ 3 ] Sebastian P J. Solar Energy Materials & Solar Cells,2001, 70 (3) : 243—244
|
| [14] | [ 4 ] Cain M , Morrell R. App l. O rganometal. Chem. , 2001,15 (5) : 321—330
|
| [15] | [ 6 ] Antonietti M. Current Opinion in Colloid & Interface Science, 2001, 6 (3) : 244—248
|
| [16] | [ 7 ] Davis S A , Breulmann M , Rhodes K H, et al. Chem. Mater. , 2001, 13 (10) : 3218—3226
|
| [17] | [ 8 ] Simon U , Franke M E. Microporous and Mesoporous Materials, 2000, 41 (1/3) : 1—36
|
| [18] | [ 13 ] Khomutov G B, Gubin S P, Khanim V V , et al. Colloids and Surfaces A , 2002, 198/200: 593—604
|
| [19] | [ 14 ] Bague R P, Khilar K C. L angmuir, 2000, 16: 905—910
|
| [20] | [ 15 ] Casom J P, Roberts C B. J. Phys. Chem. B, 2000, 104(6) : 1217—1221
|
| [21] | [ 16 ] Jiang X C, Xie Y, L u J , et al. J. M ater. Chem. , 2001,11 (7) : 1775—1777
|
| [22] | [ 18 ] Attard G S, Edgar M , Goltner C G. Acta Mater. , 1998,46 (3) : 751—758
|
| [23] | [ 19 ] Mertig M , Kirsch R, Pompe W , et al. Eur. Phys. J. D,1999, 9: 45—48
|
| [24] | [ 20 ] N iemeyer C M. A ngew. Chem. Int. Ed. , 2001, 40:4128—4158
|
| [25] | [ 21 ] 邰子厚(Tai Z H) , 梁映秋(Liang Y Q ). 大学化学(Unversity Chemistry) , 1997, 12 (3) : 1—6
|
| [26] | [ 23 ] 李彦(L i Y) , 张庆敏(Zhang Q M ) , 黄福志(Huang F Z)等. 大学化学(Unversity Chemistry) , 2000, 15 (1) : 5—9
|
| [27] | [ 25 ] Lin Z, Davis H T, Scriven L E. Langmuir, 1996, 12 (22) :5489—5493
|
| [28] | [ 27 ] Beck J S, V artuli J C, Roth W J , et al. J. Am. Chem.Soc. , 1992, 114 (27) : 10834—10843
|
| [29] | [ 28 ] Holland B T, Isbester P K, Blandfo rd C G, et al. J. Am.Chem. Soc. , 1997, 119 (29) : 6796—6803
|
| [30] | [ 32 ] Braun P V , Stupp S I. M aterials Research Bulletin, 1999,34 (3) : 463—469
|
| [31] | [ 34 ] Huang L M , W ang H T, W ang Z B, et al. A dv. M ater. ,2002, 14 (1) : 61—64
|
| [32] | [ 37 ] Elliott J M , Birkin P R, Bartlett P N , et al. L angmuir,1999, 15 (22) : 7411—7415
|
| [33] | [ 38 ] Ding J H, Gin D L. Chem. M ater. , 2000, 12 (1) : 22—24
|
| [34] | [ 42 ] Qi L M , Gao Y Y, Ma J M. Colloids and Surfaces A ,1999, 157 (1/3) : 285—294
|
| [35] | [ 45 ] Wang W , Efrima S, Reger O. J. Phys. Chem. B, 1999,103 (27) : 5613—5621
|
| [36] | [ 46 ] Quillier C, Fabre P, Cabuil V. J. Phys. Chem. , 1993, 97(2) : 287—289
|
| [37] | [ 30 ] Li Y, Wan J H, Gu Z N. Acta. Physico-Chimica Sinica,1999, 15 (1) : 1—4
|
| [38] | [ 31 ] Guo R, L iu T Q. Colloids and Surfaces A , 1997, 123/124: 587—591
|
| [39] | [ 33 ] Braun P V , O senar P, Tohver V , et al. J. Am. Chem.Soc. , 1999, 121 (32) : 7302—7309
|
| [40] | [ 35 ] A ttard G S, Bartlett P N , Co leman N R B, et al. Science,1997, 278: 838—840
|
| [41] | [ 36 ] Elliott J M , Attard G S, Bartlett P N , et al. Chem.M ater. , 1999, 11 (12) : 3602—3609
|
| [42] | [ 39 ] Gin D L , Smith R, Deng H, et al. Synthetic Metals,1999, 101: 52—55
|
| [43] | [ 40 ] Gray D H, Gin D L. Chem. M ater. , 1998, 10 (7) : 1827—1832
|
| [44] | [ 41 ] Deng H, Gin D L , Smith R C. J. Am. Chem. Soc. , 1998,120 (14) : 3522—3523
|
| [45] | [ 43 ] Wang W , Chen X, Efrima S. J. Phys. Chem. B, 1999, 103(34) : 7238—7246
|
| [46] | [ 44 ] Wang W , Efrima S, Reger O. L angmuir, 1998, 14 (3) :602—610
|
| [47] | [ 47 ] Quillier C, Ponsinet V , Cabuil V. J. Phys. Chem. , 1994,98 (14) : 3566—3569
|
| [48] | [ 48 ] Chen X, Efrima S, Regev O , et al. Science in Ch ina (Series B) , 2001, 44 (5) : 492—499
|
| [49] | [ 49 ] Chen X, Efrima S, Regev O , et al. Studies in Surface Science and Catalysis, 2001, 132: 711—714
|
| [50] | [ 50 ] Firestone M A , William s D E, Seifert S, et al. Nano Lett. , 2001, 1 (3) : 129—135
|
Full-Text
|
|
Contact Us
service@oalib.com QQ:3279437679 
WhatsApp +8615387084133
|
|
