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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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用于光致抗蚀剂的聚对羟基苯乙烯的合成及其进展
Keywords: 对羟基苯乙烯,光阻剂,活性聚合
Abstract:
随着集成电路芯片的发展,生产物理和化学性质均一的高分子光阻剂得到了各信息产业国的重视.到目前为止,含对羟基苯乙烯基的高分子光阻剂已成为光刻蚀0.11μm线宽芯片的关键技术.本文综述了目前合成窄分布的含对羟基苯乙烯基的高分子光阻剂的各种方法,在此基础上比较了各种合成方法的优缺点,为合成窄分布的含对羟基苯乙烯基的高分子光阻剂提供了必要的指导.
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