|
OALib Journal期刊
ISSN: 2333-9721
费用：99美元
|
|
|
|
聚乙二醇类表面活性剂对硅表面无电沉积Ag膜光滑作用研究
, PP. 81-86
Keywords: 无电沉积银,硅(100),聚乙二醇,开路电位～时间谱技术,原子力显微镜
Abstract:
应用原子力显微镜技术及开路电位～时间谱技术,研究了非离子表面活性剂聚乙二醇2000,6000,20000对硅(100)表面无电沉积银膜的光滑作用.实验表明硅(100)表面无电沉积银的光滑程度以及镀层的质量均随聚乙二醇聚合度的增加而变好.
| [1] | KhoperiaTN,TabatadzeTJ,ZedgenidzeTI.Formationofmicrocircuitsbyelectrolessdeposition[J].ElectrochimicaActa,1997,42(20～22):3049.
|
| [2] | JiangXiaoxia,ShenWei.TheFundamentalandApplicationofElectrolessPlating[M].Beijing:Nation-alDefenceofIndustryPublishingCompany,2000.
|
| [3] | InhergA,ZhuL,Hirschberg,etal.CharacterizationoftheinitialgrowthstagesofelectrolessAg(W)filmsdepositedonSi(100)[J].JournalofTheElectrochemicalSociety,2001,148(12):C784.
|
| [4] | YosiScham-Diamond,AlexandraInberg,YelenaSverdlov,etal.Electrolesssilverandsilverwithtungstenthinfilmsformicroelectronicsandmicroelectromechanicalsystemapplications[J].JournalofElectrochemicalSociety,2000,147(9):3345.
|
| [5] | YosiShacham-Diamand,ValeryDubin,MatthewAngyal.ElectrolesscopperdepositionforULSI[J].ThinSolidFilms,1995,262:93.
|
| [6] | YosiSchacham-Diamond,LopatinS.IntegratedelectrolessmetallizationforULSI[J].ElectrochimicaActa.,1999,44(21-22):3639.
|
| [7] | JiangZhaohua,SunDesheng,ShaoGuangjie.SurfaceChemistryofApplicationandTechnology[M].Haerbin:HaerbinIndustrialUniversityPublishingCompany,2000,264.
|
| [8] | QueDuanlin,ChenXiuzhi.SiliconMaterialScienceandTechnology[M].Hangzhou:ZhejiangUniver-sityPublishingCompany,2000.
|
| [9] | FumioShimiura.SemiconductorSiliconCrystalTechnology[M].AcademicPress,Inc.1989.
|
Full-Text
|
|
Contact Us
service@oalib.com QQ:3279437679 
WhatsApp +8615387084133
|
|
