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电化学  2005 

铜电极表面硅烷膜的自组装及其性能研究

, PP. 188-192

Keywords: 3-巯基丙基三甲氧基硅烷,自组装,耐蚀性,缓蚀效率

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Abstract:

应用自组装技术在铜电极表面上制备3巯基丙基三甲氧基硅烷自组装膜.红外光谱研究该自组装膜结构,电化学方法考察3-巯基丙基三甲氧基硅烷膜在5%NaCl溶液中对铜电极的缓蚀性能.结果表明,于不同浓度的3-巯基丙基三甲氧基硅烷乙醇溶液中自组装的硅烷膜表现出较好的抗腐蚀性.

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