OALib Journal期刊
ISSN: 2333-9721
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CatalyticPlasmaReactorforAbatementofDiluteNitrobenzene
DOI: 10.1016/S1872-2067(10)60190-8, PP. 795-799
Abstract:
?Oxidativedecompositionofdilutenitrobenzeneinairwascarriedoutinacatalyticplasmareactorwithaninnerelectrodemadeofsinteredmetalfibres(SMF)thatalsoactedascatalyst.Theparametersoftheconcentration,specificinputenergy,andgasresidencetimewereoptimized.ThemodificationoftheSMFinnerelectrodewithtransitionmetaloxideslikeMnOxandCoOxoxidespromotedcompleteoxidation,especiallyatlowinputenergy.CoOx/SMFshowedhigheractivitythanMnOx/SMFandSMF,andcouldoxidisecompletely100ppmofnitrobenzeneat300J/L.
References
[1] | rashima K, Chang J S. IEEE Trans Ind Appl, 2000, 7: 602
|
[2] | ubrahmanyam Ch, Magureanu M, Renken A, Kiwi-Minsker L. Appl Catal B, 2006, 65: 150
|
[3] | older J W. Toxicol Ind Health, 1999, 15: 445
|
[4] | cinnes R G. Chem Eng Prog, 1995, 91(11): 35
|
[5] | ong Y H, Kim S J, Choi K, Yamamoto T. J Electrostat, 2002, 55: 189
|
[6] | ogelschatz U. Plasma Chem Plasma Process, 2003, 23: 1
|
[7] | olzer F, Roland U, Kopinke F D. Appl Catal B, 2002, 38: 163
|
[8] | da T. J Electrostat, 2003, 57: 293
|
[9] | enetrante B M, Hsiao M C, Bardsley J N, Merritt B T, Vogtlin G E, Kuthi A, Burkhart C P, Bayless J R. Plasma Sources Sci Technol, 1997, 6: 251
|
[10] | Durme J V, Dewulf J, leys C, Langenhove H V. Appl Catal B, 2008, 78: 324
|
[11] | Subrahmanyam Ch, Renken A, Kiwi-Minsker L. Appl Catal B, 2006, 65: 157
|
[12] | Karuppiah J, Sivachandiran L, Karvembu R, Subrahmnayam Ch. Chem Eng J, 2010, 165: 194
|
[13] | Subrahmanyam Ch, Magureanu M, Renken A, Kiwi-Minsker L. Appl Catal B, 2006, 65: 150
|
[14] | Subrahmanyam Ch, Magureanu M, Laub D, Renken A, Kiwi- Minker L. J Phys Chem C, 2007, 111: 4315
|
[15] | Kiyokawa K, Matsuoka H, Itou A, Hasegawa K, Sugiyama K. Surf Coat Technol, 1999, 112: 25
|
[16] | Kirkpatrick M J, Finney W C, Locke B R. Catal Today, 2004, 89: 117
|
[17] | Czernichowski A. NATO ASI ser. G, 1993, 34: 371
|
[18] | Roland U, Holzer F, Kopinke F D. Appl Catal B, 2005, 58: 217
|
[19] | Roland U, Holzer F, Kopinke F D. Appl Catal B, 2005, 58: 227
|
[20] | Holzer F, Roland U, Kopinke F D. Appl Catal B, 2002, 38: 163
|
[21] | Magureanu M, Mandache N B, Eloy P, Gaigneaux E M, Parvulescu V I. Appl Catal B, 2005, 61: 12
|
[22] | Subrahmanyarn C, Renken A, Kiwi-Minsker L. Plasma Chem Plasma Process, 2007, 27: 13
|
[23] | Roland U, Holzer F, Kopinke F D. Catal Today, 2002, 73: 315
|
[24] | Futamura S, Einaga H, Kabashima H, Hwan L Y. Catal Today, 2004, 89: 89
|
[25] | Dhandapani B, Oyama S T. Appl Catal B, 1997, 11: 129
|
[26] | Futamura S, Zhang A H, Yamamoto T. J Electrostat, 1997, 42: 51
|
[27] | Yamamoto T, Mizuno K, Tamori I, Ogata A, Nifuku M, Michalska M, Prieto G. IEEE Trasn Ind Appl, 1996, 32: 100
|
[28] | Kim H H, Oh S M, Ogata A, Futamura S. Appl Catal B, 2005, 56: 213
|
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