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聚酰亚胺/TiO2纳米杂化薄膜耐电晕性能的研究

, PP. 142-147

Keywords: 纳米二氧化钛,聚酰亚胺,耐电晕,组分,杂化

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Abstract:

通过原位聚合法制备聚酰亚胺/二氧化钛(PI/TiO2)纳米杂化薄膜并研究其耐电晕性能。利用光激发放电方法(photon-stimulateddischarge,PSD)与光度计测试杂化薄膜的射技术(smallangleX-rayscattering,SAXS)表征薄膜表面的形貌与分形特征。实验结果表明:引入TiO2增加了薄膜中的陷阱密度,提高了薄膜的质量分形维数,在5%组分时出现表面分形,薄膜结构变得致密;随着TiO2组分的增加,薄膜的耐电晕寿命由3.9h(0%)增加到49h(7%),薄膜的紫外吸收能力提高;随着电晕时间增加,杂化薄膜表面的聚酰亚胺分解,TiO2颗粒逐渐积累,起到屏蔽电晕侵蚀的作用。因此,有机-无机界面的陷阱状态、TiO2的特性以及薄膜整体分形结构的协同效应提高了杂化薄膜耐电晕性能。

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