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金属高温氧化的计算模拟研究

, PP. 54-58

Keywords: 高温氧化,计算机模拟,扩散

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Abstract:

简要介绍和评述了电子、原子和微米尺度层次上的计算模拟方法,在此基础上按照各个尺度层次上的金属高温氧化的主要方向综述了国内外的计算模拟研究进展,主要涉及初期氧化微观过程与膜结构、活性元素效应(REE)机理、扩散与氧化动力学和氧化膜内应力形成与释放四个方面,包括作者开展的一些工作.〖HT5”H〗中图分类号〖HT5”SS〗〓〓〖HT5”H〗文献标识码〖HT5”SS〗A〓〓

References

[1]  RChakarova,DEOner,IZoricetal.MonteCarlosimulationofinitialAl(111)oxidation[J].SurfaceScience,2001,472:63.
[2]  PYHou.BeyondtheSulfurEffect[J].OxidationofMetals,1999,52(3):337.
[3]  APaul,JAOdriozola,MASanMigueletal.ExperimentalandmoleculardynamicssimulationanalysisofLaCrO3precipitationinchromiascale[J].ActaMater.,2000,48:2951.
[4]  DJHarris,JHHarding,GWWatson.ComputersimulationofthereactiveelementeffectinNiOgrainboundaries[J].ActaMater.,2000,48:3039.
[5]  LZhou,XWei,ARandomwalk-CellularAutomatonmodelofprecipitationofinternaloxidesinalloys[J].Script.Mater.,1997,37:1483.
[6]  LZhou,XWei,ARandomwalk-CellularAotomatonsimulationofinternaloxidationanditstransitiontoexternaloxidation[J].Script.Mater.,1999,40:365.
[7]  C -JWang,Y -CChang.TEMstudyofinternaloxidationofFe-Mn-Al-Calloy[J].OxidationofMetals,2002,57(3):363.
[8]  SGeng,FWang,SZhu.High-temperatureoxidationbehaviorofsputteredIN 738nanocrystallinecoating[J].OxidationofMetals,2002,57(3):231.
[9]  LZhou,XWei.Asimulationstudyofvaryingnitrogenpotentialonbehaviourofprecipitationinnitridationofalloys[J].ComputationalMaterialsScience,2002,23:204.
[10]  魏秀琴,邓章铭,周浪.合金钢渗氮与氮化物沉淀过程的元胞自动机模拟[J].材料科学与工程学报,2003,21(6):879.
[11]  LZhou.AMonte-Carlosimulationstudyoftheminimumtimerequiredforformationofstableoxidescaleinoxidationofalloys[J].ComputationalMaterialsScience,1997,7:336.
[12]  LSalles-Desvignes,TMontesin,CValotetal.Near-CoincidenceLatticeMethodforthedeterminationofepitaxystrainsduringoxidationofmetals[J].ActaMater.,2000,48:1505
[13]  DierkRaabe[德],项金钟,吴兴惠译.计算材料学[M ].北京:化学工业出版社,2002.
[14]  Frenkel&Smit[荷],汪文川等译.分子模拟[M ].北京:化学工业出版社,2002.
[15]  AEsteve,MDRouhani,PhFaurous.Modelingofthesilicon(100)thermaloxidation:from quantumtomacroscopicformulation[J ].MaterialsScienceinSemicondoctorProcessing,2000,3:47.
[16]  AEsteve,MDRouhani,DEsteve.ModelingmethodologyofsiliconoxidationfromquantumcalculationtoMonteCarlolevel[J].MicroelectronicsReliability,1999,39:275.
[17]  TUchiyama,TUda,KTerakuru.Initialoxide-growthprocessonSi(100)surface[J].SurfaceScience,1999,433~435:896.
[18]  VIsabellaPazzi,PHTPhilipsen,EJBaerendsetal.OxygenadsorptiononAg(110):densityfunctionaltheorybandstructurecalculationanddynamicalsimulations[J].SurfaceScience,1999,443(1):1.
[19]  TSasaki,TOhno.AdsorptionoftheoxygentotheAl(111)surface[J].ComputationalMaterialsScience,1999,14:8.
[20]  RKKalia,TJCambell,AChatterjeeetal.Multiresolutionalgorithmsformassively parallelmoleculardynamicssimulationsofnanostructuredmaterials[J].ComputerPhysicsCommunications,2000,128:245.

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