OALib Journal期刊
ISSN: 2333-9721
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石英晶体微天平在金属腐蚀研究中的应用
, PP. 38-41
Keywords: 石英晶体微天平(QCM),腐蚀,钝化,缓蚀剂
Abstract:
简要介绍了石英晶体微天平(QuartzCrystalMicrobalance,简称QCM)技术的基本原理,综述了QCM在金属大气腐蚀、阳极溶解、钝化、局部腐蚀以及缓蚀剂缓蚀行为和机理研究等方面的应用及其进展,讨论了QCM用于金属腐蚀研究的优点和局限性.
References
[1] | 〔25〕ShabanA ,KalamanE ,BacskaiJ.8SEIC ,1995,Suppl(10):951
|
[2] | 〔27〕SzocsE ,VastagG ,ShabanA .J .Appl.Electrochem.,1999,29(11):1339
|
[3] | 〔28〕YanCW ,LinHC ,CaoCN .Electrochim.Acta,2000,45(17):2815
|
[4] | 〔29〕GanFX ,DaiZX ,WangDH ,etal.Corrosion.Sci.,2000,42(8):1379
|
[5] | 〔30〕戴忠旭.武汉:武汉大学硕士论文,1997
|
[6] | 〔1〕NomuraT .Anal.Chim.Acta,1981,124(1):81
|
[7] | 〔2〕BruckensteinS ,Electrochim.Acta,1985,30(10):1295
|
[8] | 〔3〕WuBL ,LeiHW ,ChaCS .J.Electroanal.chem.,1994,374:97
|
[9] | 〔4〕SauerbreyG .Z .Phys.,1959,155:206
|
[10] | 〔5〕ForslundM ,LeygrafC .J.Electrochem.Soc,1996,143(3):839
|
[11] | 〔6〕ForslundM ,MajorosJ,LeygrafC .J .Electrochem.Soc.,1997,144(8):2637
|
[12] | 〔7〕ZakipourS ,leygrafC .Br.Corros.J .,1992,27(4):295
|
[13] | 〔8〕SeoM ,SawamuraI ,SatoN .Proc.-Electrochem.Soc.,1991,91:165
|
[14] | 〔9〕ItohJ ,SasakiT ,SeoM .Crro.Sci.,1997,39(1):193
|
[15] | 〔10〕SchumacherR ,MullerA .J .Electroanal.Chem.,1987,219:311
|
[16] | 〔11〕TarolyA ,legalAL -M ,KeddamMetal.Electrochim.Acta,1992,37(12):2195
|
[17] | 〔12〕SeoM ,YoshidaK ,NodaK .MaterialsSci.Forum,1995,192~194(2):755
|
[18] | 〔13〕JuzeliunasE ,SamuliiavicieneM .Electrochim.Acta,1992,37(14):2611
|
[19] | 〔14〕ItagakiM ,NakazawaH ,WatanabeK .CorrosionSci.,1997,39(5):901
|
[20] | 〔15〕ChandlerC ,JuJ-B ,AtanasoskiR ,etal.Corrosion,1991,47(3):179
|
[21] | 〔16〕YiboM ,EuijinH ,DanielAS .J .Electrochem.Soc.,1996,143(1):37
|
[22] | 〔17〕DanielAB ,MichaelDW .Chem.Rev.,1992,92(6):1355
|
[23] | 〔18〕朱则善.化学通报,1991,9:27
|
[24] | 〔19〕SchmutzP ,LandoltD .Electrochim.Acta,1999,45(6):899
|
[25] | 〔20DeakinMR ,MelroyOR .J .Electrochem.Soc.,1989,136(2):349
|
[26] | 〔21〕OltraR ,EfimovIO .J.Electrochem.Soc.,1994,141(7):1838
|
[27] | 〔22〕DirkJ ,JoachimS ,PickeringHW .J .Electrochem.Soc.,1995,142(7):2170
|
[28] | 〔23〕PickeringHW ,WellKG ,SakuraiT .8SEIC ,1995,Suppl(10):15
|
[29] | 〔24〕ZucchiF ,FonsatiM ,TrabanelliG .J.Appl.Electrochem.,1998,28(4):441
|
[30] | 〔26〕TelegdiJ ,ShabanA ,KalmanE .ElectrochemicaActa,2000,45(22/23):3639
|
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