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化学微蚀刻法和微细电镀法制备微流控芯片金属模具工艺对比研究

DOI: 10.11903/1002.6495.2014.192, PP. 264-268

Keywords: 化学微蚀刻,微细电镀,侧壁陡度,微流控芯片模具

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Abstract:

针对化学微蚀刻法和微细电镀法制备微流控芯片金属模具进行了工艺对比研究。采用激光共聚焦显微镜分别检测表征由这两种加工工艺制备所得的模具微结构特征,对其侧壁陡度、尺寸均匀性、粗糙度进行对比分析。结果表明,化学微蚀刻法制备的模具微结构的侧壁呈不规则弧形、尺寸均匀性差,表面粗糙度较大(Ra=3.58μm)。而微细电镀法制备的模具微结构的侧壁则呈规则的梯形、尺寸均匀性好,表面粗糙度较小(Ra=0.65μm)。微细电镀法制备的微流控芯片金属模具综合效果比化学微蚀刻好。

References

[1]  Manz A, Graber N, Widmer H M. Miniaturized total chemical analysis systems: a novel concept for chemical sensing [J]. Sensor. Actuator. B-Chem., 1990, 1(1): 244
[2]  Whitesides G M. The origins and the future of microfluidics [J]. Nature, 2006, 442: 368
[3]  Dittrich P S, Manz A. Lab-on-a-chip: microfluidics in drug discovery [J]. Nat. Rev. Drug Discov., 2006, 5(3): 210
[4]  Lee L J. Design and fabrication of CD-like microfluidic platforms for diagnostics: Polymer-based microfabrication [J]. Biomed. Microdevices, 2001, 3(4): 339
[5]  Li C W, Cheung C N, Yang J, et al. PDMS-based microfluidic device with multi-height structures fabricated by single-step photolithography using printed circuit board as masters [J]. Analyst, 2003, 128(9): 1137
[6]  罗怡, 王晓东, 刘冲等. 一种新型微流控芯片金属热压模具的制作工艺研究 [J]. 中国机械工程, 2005, 16(17): 1505
[7]  宋满仓, 刘莹, 祝铁丽等. 塑料微流控芯片的注塑成型 [J]. 纳米技术与精密工程, 2012, 9(4): 329
[8]  Rao P N, Kunzru D. Fabrication of microchannels on stainless steel by wet chemical etching [J]. J. Micromechan. Microeng., 2007, 17(12): N99
[9]  Ho S, Nakahara T, Hibbard G D. Chemical machining of nanocrystalline Ni [J]. J. Mater. Proc. Technol., 2008, 208(1): 507
[10]  Fonda P, Nakamoto K, Heidari A, et al. A study on the optimal fabrication method for micro-scale gyroscopes using a hybrid process consisting of electric discharge machining, chemical etching or micro-mechanical milling [J]. CIRP Annals-Manuf. Technol., 2013, 62(1): 183
[11]  黄红光, 郭钟宁, 王冠等. 模具钢表面阵列微结构蚀刻工艺的实验研究 [J]. 腐蚀科学与防护技术, 2014, 26(2): 194
[12]  Kawan A, Yu S J, Park H J, et al. Erratum to: Fabrication of geometric sapphire shaped InGaN/Al 2 O 3 (S) LED scribed by using wet chemical etching [J]. J. Korean Phys. Soc., 2014, 64(12): 1935
[13]  张午花, 费敬银, 骆立立等. 脉冲电沉积高速Ni工艺研究 [J]. 中国腐蚀与防护学报, 2013, 33(4): 317
[14]  McGeough J A, Leu M C. Electroforming process and application to micro/macro manufacturing [J]. CIRP Annals-Manuf.Technol., 2001, 50(2): 499
[15]  Weinmann M, Weber O, B?hre D, et al. Photolithography-rlectroforming-pulse electrochemical machining: An innovative rrocess chain for the high precision and reproducible manufacturing of complex microstructures [J]. Int. J. Electrochem. Sci., 2014, 9: 3917
[16]  Kim J S, Min I K, Kim J D. Development of a selective electroforming process for micro-sized probe tips used in LCD inspection machines [J]. J. Phy., Conf. Ser., 2012, 379(1): 012039

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