Sun L J, Lian J S. Effects of the initial stencil width on stainless steel wet chemical etching: combined model and experimental investigations [J]. J. Micromech. Microeng., 2009, 19: 1
[8]
McClean J L. Etchant with increased etch rate [P]. U. S. Pat., 4462861, 1984
[9]
Takechi K, Kanoh H, Otsuki S. Very high rate and uniform glass etching with HF/HCl spray for transferring thin-film transistor arrays to flexible substrates [J]. Jpn. J. Appl. Phys., 2006, 45: 6008