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常温和100~800MPa压力下石膏的Raman光谱研究

DOI: 10.11858/gywlxb.2006.01.006, PP. 25-28

Keywords: 石膏,Raman光谱,高压,金刚石压腔

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Abstract:

利用金刚石压腔装置测量了高压下石膏中S—O键的4种振动模式和结晶水中羟基伸缩振动Raman位移,研究结果表明:在常温(25℃)和100~800MPa压力范围内,石膏中S—O键的Raman谱峰的位移随压力的增加而向高波数方向移动,结晶水中羟基的两个伸缩谱峰随着压力的增加而向低波数方向移动,同时得到了各个谱峰与压力之间的关系式,其中结晶水中羟基的两个伸缩谱峰的dν/dp值有较大不同,是由于结晶水中含有两个强度不同的氢键所致。

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