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氮粒子对Ti-Si-N岛构型演变影响的第一性原理计算

, PP. 1364-1368

Keywords: 界面形成条件,相分离,构型演变,激活能,第一性原理

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Abstract:

为了研究Ti-Si-N薄膜生长过程中界面的形成,采用第一性原理计算了在TiN(001)表面上3N-2Ti-1Si、4N-1Ti-1Si和4N-2Ti-1Si岛的各构型的总能量和吸附能,并且利用推移弹性带(NEB)的方法计算了各岛构型演变过程中所需的迁移激活能。计算结果表明:Ti粒子在岛内的构型是低能量的稳定结构,这种构型是由SiN相从TiN相中分离出来而形成的;在3N-2Ti-1Si、4N-1Ti-1Si和4N-2Ti-1Si3种构型的演变方式中,3N-2Ti-1Si构型演变所需的激活能较小,更容易实现构型演变;适量地增加N粒子的沉积比例,可以使岛构型演变所需的激活能减小,促进SiN相与TiN相的分离;当N与Ti的粒子数比例达到3:2时,界面最容易形成。

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