FePt-C颗粒薄膜的制备和表征
Fabrication and Characterization of FePt-C Granular Thin Films

DOI: 10.12677/MS.2014.44020, PP. 134-138

Keywords: FePt颗粒薄膜，磁控溅射法
Fept-C Granular Film, Magnetron Sputtering Method

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Abstract:

本文采用磁控溅射法在热氧化硅基片上生长FePt颗粒薄膜。利用MgO籽层来引发FePt合金薄膜的fct织构，采取加入C的方法来减小其颗粒尺寸。采用X射线衍射仪(XRD)、超导量子干涉仪(SQUID)和透射电镜(TEM)对FePt颗粒进行表征，结果表明制备的样品具有优良的L10相结构，其磁滞曲线表明方形度很好，而且垂直矫顽力能有12 kOe，颗粒大小为8 nm。该磁性薄膜非常适合用做下一代高密度磁存储媒质，能大幅度提高磁存储密度。
FePt-C granular thin film was fabricated on a thermally-oxidized silicon substrate by magnetron sputtering method. A MgO interlayer was applied to induce the L10 structure in the FePt alloy film. The addition of carbon can reduce the grain size of FePt. XRD, SQUID and TEM were applied to measure its structure, magnetic properties, and microstructures, respectively. Results show that the film has excellent L10 order, and the squareness of MH loop is close to unity, with a high per-pendicular coercivity of 12 kOe. The microstructure shows that it has small grain size of 8 nm with uniform distribution. This magnetic film is a promising candidate for magnetic recording media with ultra-high areal density.

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