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OALib Journal期刊
ISSN: 2333-9721
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Chemical vapour deposition of diamond using low pressure flat combustion flame

Keywords: low pressure flat flame , Diamond CVD

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Abstract:

Diamond coatings were deposited ontoMo and WCa Co substrates using a low pressure premixed acetylenea oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of ' 7 cm2 onto Mo substrates, the coating thickness after 1 h deposition amounted to ' 1 mm. Upon machining an Ala 12 % Si alloy under identical conditions, the diamond coated WCa Co cutting tool inserts showed 30 % less wear than the as-received inserts.

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