Modeling of Fractal Growth by Simulation

In the present work deals with the simulation of fractal growth patterns in electrodeposition (Diffusion limited aggregation) using concept of off lattice random walk.The simulation of electrodeposition under different electric field conditions is implemented to simulate the growth of dendritic patterns in circular cell geometry. The DLA growth in circular cell geometry is under the influence of two main driving forces, namely, the random Brownian motion of the ions and the radial ionic motion due to the applied electric field. In the simulation, the effect of radial movement of ions is superimposed over the zigzag random motion of the ions in the electrolyte. The relative influence of the random motion and radial motion is controlled by introducing a biasing parameter. It is observed that the growth patterns with lower values of bias (corresponding to lower electric field) are less crowded with limited branching and more closely resemble true DLA. As the electric field is increased (higher value of B), the growth tends to be dense and with more crowding of branches. The box counting technique was implemented to calculate the fractal dimensions of the patterns developed. The results are compared with the experimental observations.