In？uence of substrate temperature on the microstructure of TiN/TiC

TiN/TiC bilayers were deposited using Plasma Assisted Physical Vapor Deposition technique PAPVD)-Pulsed Arc, varying the substrate temperature ina range of 100-120？C, with intervals of 5？C. Coatings were analyzed through XPS and XRD. From signal processing narrow spectrum of XPS and the XRD patterns, was determined the formation of TiN (Titanium Nitride), TiC (Titanium Carbide) and TiCN (Titanium Carbide Nitride) compounds in the crystallographic